摘要
近年來，台灣光電產業產品的增加，造成光電製程污染物相對增加，光電製程廢水中含有二甲基亞楓(DMSO)、乙醇胺(MEA)及氫氧化四甲基銨(TMAH)等高濃度有機廢水，然而光電製程廢水經由廢水生物系統處理時，被微生物代謝轉化成易揮發異味的二甲基硫(DMS)惡臭物質，處理含二甲基硫惡臭廢氣時，需經由Scrubber添加NaOCL氧化處理，因過量添加NaOCL會造成二次污染物氯氣的衍生。光電產業製程廢水處理廠操作過程中常伴隨周界環境異味逸散，其中包含二甲基硫、氯氣、硫化氫、氨氣等污染物，尤其氯氣、硫化氫、氨氣於空污法中列為毒性污染物質，直接影響廢水處理廠操作維護人員嗅覺及健康的影響。因此，本研究針對南部某一光電廠區進行周界空氣中二氧化硫、氯氣、硫化氫、氨氣及一氧化碳進行調查，並以攜帶型直讀儀器量測光電產業廠區周界(選擇41個監測點)濃度變化。實驗監測結果，二甲基硫濃度大都介於6 ppb ~47 ppb 之間，平均濃度約12.97 ppb，與背景值善化測站檢測數據平均濃度約4.00 ppb比較。氯氣濃度大都介於0 ppb ~5 ppb之間，平均濃度約1.36 ppb，善化測站無檢測項目。硫化氫、氨氣及一氧化碳濃度檢測ND。本研究顯示，所量測南部某一光電廠區周界空氣品質皆符合固定污染源空氣污染物排放標準(二氧化硫<0.3 ppm、氯氣<0.02 ppm、硫化氫<0.1 ppm、氨氣<1 ppm)。
關鍵字：光電產業、二甲基硫、氯氣。
ABSTRACT
In recent years, as the variety of products of Taiwan's optoelectronics industry increases, the pollutants from optoelectronics processes increase accordingly. The wastewater from optoelectronics processes contains high concentration organic wastewater, such as DMSO, MEA and TMAH. When the wastewater is treated by the wastewater biological system, it is converted by microbial metabolism into DMS odorant, which is likely to volatilize foul odor. When treating the effluvial waste gas containing DMS, the scrubber should be filled with NaOCL for oxidation treatment, as excessive addition of NaOCL would produce a secondary pollutant, Cl2. The foul odor often dissipates into the ambient environment during the operating procedure of wastewater treatment plant, including DMS, Cl2, H2S and NH3 pollutants. Among those, Cl2, H2S and NH3 are listed as toxic pollutants in the Air Pollution Control Act, seriously affecting the sense of smell and health of the operators and maintainers of the wastewater treatment plants. Therefore, this study investigated the SO2, Cl2, H2S, NH3 and CO in the ambient air of an optoelectronics site area in southern Taiwan. A portable direct reader was used to measure the concentration changes around the optoelectronics industry site area (41 monitoring points). The monitoring results showed that the SO2 concentration was in the range of 6 ppb~47 ppb, and the mean concentration was 12.97 ppb. The mean concentration in the sense data of background of Shanhua Station was 4.00 ppb. The Cl2 concentration was in the range of 0 ppb~5 ppb, and the mean concentration was 1.36 ppb. Shanhua Station had no testing item. The H2S, NH3a and CO concentrations were ND. This study found that the ambient air quality of the optoelectronics site area measured in south Taiwan conformed to the Stationary Pollution Source Air Pollutant Emissions Standards (SO2 <0.3 ppm, Cl2 <0.02 ppm, H2S <0.1 ppm, NH3 <1 ppm).
Keywords: TFT-LCD;DMS; Cl2
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